Ноябрь 2017
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Вакансии

Crystal processing equipment

Substrate washing, photoresist coating (spin and aerosol) and development (EVG, Austria)

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Contact photolithography and matching plant (SUSS, Germany)

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Chemical etching of silicon wafers section – equipment (CSR, Czech Republic)

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Diffusion furnace (SVCS, Czech Republic)

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Cluster plant of plasma chemical etching (SPTS, UK)

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Cluster plant of deposition (SEGI, USA)

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